Provider of EUV turnkey light sources.

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Adlyte in the news: Solid State Technology

Adlyte to present at the following event:
SPIE Advanced Lithography 2013 Conference & Exhibition - Nature
24 -28 February 2013; San Jose, California, United States
SPIE Advanced Lithography is the internationally recognized forum for reporting state-of-the-art research and development in optical lithography, resists, metrology, EUV, immersion, double patterning, DFM, and imprint lithography.

Adlyte attended and  presented poster papers at the following event:
2012 International Symposium on Extreme Ultraviolet Lithography
30 September 2012; Brussels, Belgium 
Hosted by imec in cooperation with SEMATECH and EIDEC, this year’s Symposium promises to be the most informative event, committed to addressing challenges and enabling solutions for advancing EUVL. The industry still faces a significant number of challenges for EUVL pilot line insertion in 2012/2013 and also for HVM introduction in late 2013. These challenges include progress in key critical technology issues such as:
- Mask yield and defect inspection/review infrastructure
- Long term reliable source operation for HVM
- Resist resolution, sensitivity and LER met simultaneously
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Adlyte attended and  presented poster papers at the following event:
SPIE Photomask Technology | Annual BACUS Symposium
11 - 13 September 2012; Monterey, California, United States
SPIE Photomask Technology opened Tuesday morning with perspective from the end user, with a well-received talk by NVIDIA Corp. Vice Presidnet of Technology and Foundry John Chen on "Transforming design to chips: an end user's point of view on mask making. Noting that today's definition of doing it right "means perfection," Chen emphasized the necessity for performance, precision, and perfection for the continuation of Moore's Law. (Read Full Event Review)

Adlyte attended and  presented poster papers at the following event:
SPIE Advanced Lithography 2012 Conference

12 -16 February 2012; San Jose, California, United States
SPIE Advanced Lithography is the internationally recognized forum for reporting state-of-the-art research and development in optical lithography, resists, metrology, EUV, immersion, double patterning, DFM, and imprint lithography.

17-19 October 2011; Miami, Florida 
International Symposium on Extreme Ultraviolet Lithography
The EUVL Symposium is part of SEMATECH's ongoing commitment to help mature the technology and infrastructure for extreme ultraviolet lithography (EUVL), including sources, masks, optics, resists, contamination control, and metrology to support EUVL pilot line manufacturing requirements.
Hosted by SEMATECH, Selete, EUVA and IMEC.

27 February - 4 March 2011
SPIE Advanced Lithography Conference San Jose, California

October 17-20, 2010
2010 International Symposium on Extreme Ultraviolet Lithography Kobe, Japan